合肥工業(yè)大學(xué)機(jī)械與汽車工程學(xué)院導(dǎo)師:王旭迪

發(fā)布時(shí)間:2021-10-28 編輯:考研派小莉 推薦訪問:
合肥工業(yè)大學(xué)機(jī)械與汽車工程學(xué)院導(dǎo)師:王旭迪

合肥工業(yè)大學(xué)機(jī)械與汽車工程學(xué)院導(dǎo)師:王旭迪內(nèi)容如下,更多考研資訊請(qǐng)關(guān)注我們網(wǎng)站的更新!敬請(qǐng)收藏本站,或下載我們的考研派APP和考研派微信公眾號(hào)(里面有非常多的免費(fèi)考研資源可以領(lǐng)取,有各種考研問題,也可直接加我們網(wǎng)站上的研究生學(xué)姐微信,全程免費(fèi)答疑,助各位考研一臂之力,爭(zhēng)取早日考上理想中的研究生院校。)

合肥工業(yè)大學(xué)機(jī)械與汽車工程學(xué)院導(dǎo)師:王旭迪 正文

  ?個(gè)人簡(jiǎn)介
  王旭迪,男,1974年出生,博士研究生學(xué)歷,教授,1996年合肥工業(yè)大學(xué)真空技術(shù)及設(shè)備專業(yè)本科,2005年中國(guó)科學(xué)技術(shù)大學(xué)國(guó)家同步輻射實(shí)驗(yàn)室工學(xué)博士。2005年-2006年英國(guó)盧瑟福國(guó)家實(shí)驗(yàn)室訪問學(xué)者。已發(fā)表SCI、EI源刊論文三十余篇,申請(qǐng)發(fā)明專利10項(xiàng)。主講課程:真空物理,微納加工技術(shù)等。

  ?研究領(lǐng)域
  科研方向:微納加工技術(shù)及其應(yīng)用,真空檢漏與計(jì)量
  主持項(xiàng)目:國(guó)家863探索導(dǎo)向類項(xiàng)目,教育部留學(xué)基金,安徽省自然科學(xué)基金,企業(yè)項(xiàng)目等。

  ?發(fā)表論文
  鄭正龍; 王旭迪; 付紹軍; 聚碳酸酯基片超疏水表面的制備與表征;真空科學(xué)與技術(shù)學(xué)報(bào);2014-03-15
  涂呂星; 王旭迪; 逆向熱鍵合技術(shù)制作SU-8膠納流控通道;真空科學(xué)與技術(shù)學(xué)報(bào);2013-12-15
  李鑫; 王旭迪; 基于PDMS微結(jié)構(gòu)模板轉(zhuǎn)印技術(shù)的研究;真空科學(xué)與技術(shù)學(xué)報(bào);2013-06-15
  Jian Jin, Xudi Wang, Nano/micro-channel fabrication based on SU-8 using sacrificial resist etching method, Micro&Nano Letters  2012,7 1320
  Liangjin Ge, Xudi Wang, Huoyao Chen,F(xiàn)lexible subwavelength gratings fabricated by reversal soft UV nanoimprint,CHINESE OPTICS LETTERS 10(9), 090502(2012),
  Liangjin Ge, L. Jay Guo, Xudi Wang,Silver lines electrode patterned by transfer printing, Microelectronic Engineering 97 (2012) 289–293
  Xiaojun Li, Xudi Wang,et al, Fabrication of size-controllable nanofluidicchannels using angled physical vapor deposition, Microelectronic Engineering vol. 98 October, 2012. p. 647-650
  Y. Zhang, X. Wang, Y. Xing et al. One-Step Growth and Alignment of Ultralong Nanowire Arrays and Their Flexible Photodetector Devices. J. Mater. Chem., 2012, 22, 14357
  Xiaojun Li, Yong Chen, Keqiang Qiu, Xudi Wang, Multiple centimetre-long fluidic-channels with smooth and vertical sidewall fabricated by novel NIL mould and thermal bonding, Microelectronic Engineering 98,(2012) 720–724
  X. Wang, J. Jin, X. Li et al, Low-pressure thermal bonding, Microelectron Eng. 88 (2011) 2427–2430
  X. Li, X.Wang, et al, Fabrication of micro/nano fluidic system combining hybrid mask-mould lithography with thermal bonding, Microelectron Eng, 87(2010), 722-755
  X. Wang, L. Ge, J. Lu, S. Fu, Z Cui. Fabrication of Enclosed Nanofluidic channels by UV cured imprinting and thermal bonding of SU-8 Photoresist. Microelectron Eng. 86(2009), 1347-1349
  X. Wang, Yifang Chen, Ling Wang and Zheng Cui. Fabrication of nanoimprint template in Si with high etch rate by non-switch DRIE process. Microelectron Eng. 85(2008), 1015-1017
  X. Wang, Y. Chen, S. Fu, Z Cui. Free-standing SU-8 subwavelength gratings fabricated by UV curing imprint. Microelectron Eng. 85(2008), 910-913
  X. wang, Y. liu,X. Xu, S. Fu, Z Cui. Reactive ion beam etching of HfO2 film and removal of sidewall of sidewall redeposition. J. Vac. Sci. Technol. A ,24 (4): 1067-1072 JUL-AUG 2006
  X Wang, Y. Chen, S. Fu, Z Cui. High density patterns fabricated in SU-8 by UV curing nanoimprint;Microelectron Eng., 84(2007), 872-876
  X wang, Liangjin Ge, Jingjing Lu, Shaojun Fu, High aspect ratio grating fabrication in SU-8 resist by UV-Curing nanoimprint, SPIE,Vol. 7159, (2008)
  X. Wang, Y. Chen, S. Fu, Z Cui. Rapid nanofabrication with high density pattern with UVN30 Chemically Amplified Resist. SPIE,Vol. 6724, 67240A, (2007)
  X. Wang, Y. Chen, S. Fu, Z Cui.Free-standing SU-8 gratings fabricated by sacrificial layer-assisted UV curing imprint. SPIE, Vol. 6827, 68271T, (2007)
  X.Wang et al, Reactive ion beam etching of HfO2 film using Ar/CHF3 gas chemistries, SPIE,5636,577(2005)
  Z Cui, X. Wang, Y Li, G Y Tian, High sensitive magnetically actuated micromirrors for magnetic field measurement. Sensors and Actuators A 138 (2007) 145–150
  Chen, YF; X. Wang, et al, Nano metamaterials and photonic gratings by nanoimprint and hot embossing, IEEEConference: International Symposium on Biophotonics, Nanophotonics and Metamaterials, Date: OCT 16-18, 2006 Hangzhou PR CHINA
  Y. Chen, L. Zheng,  X. Wang et al. Fabrication of ferromagnetic  nanoconstrictions by electron beam lithography using LOR/PMMA bilayer technique. Microelectron Eng., 84(2007), 1499-1502

  ?聯(lián)系方式
  電子郵箱:wxudi@hfut.edu.cn

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